By Theodor Schneller (auth.), Theodor Schneller, Rainer Waser, Marija Kosec, David Payne (eds.)
This is the 1st textual content to hide all points of answer processed practical oxide thin-films. Chemical answer Deposition (CSD) contains all answer dependent skinny- movie deposition options, which contain chemical reactions of precursors in the course of the formation of the oxide movies, i. e. sol-gel sort routes, metallo-organic decomposition routes, hybrid routes, and so on. whereas the improvement of sol-gel style tactics for optical coatings on glass through silicon dioxide and titanium dioxide dates from the mid-20th century, the 1st CSD derived digital oxide skinny motion pictures, corresponding to lead zirconate titanate, have been ready within the 1980’s. when you consider that then CSD has emerged as a hugely versatile and good value process for the fabrication of a truly wide array of practical oxide skinny motion pictures. software components comprise, for instance, built-in dielectric capacitors, ferroelectric random entry thoughts, pyroelectric infrared detectors, piezoelectric micro-electromechanical structures, antireflective coatings, optical filters, conducting-, obvious conducting-, and superconducting layers, luminescent coatings, gasoline sensors, skinny movie solid-oxide gasoline cells, and photoelectrocatalytic sunlight cells. within the appendix distinctive “cooking recipes” for chosen fabric structures are offered.
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Additional resources for Chemical Solution Deposition of Functional Oxide Thin Films
Emphasis will be given to the carboxylates of alkaline and rare earth elements as well as selected metals from the groups 4 to 14 of the periodic table of elements, since they are relevant for the synthesis of precursor solutions for CSD of ferroelectric, dielectric and conducting perovskite thin films. The coating process for producing thin oxide films from pure carboxylate based precursor solutions is known as metallo-organic-decomposition (MOD),1 which is an indication that the organic matrix which surrounds the metal ions in the as-deposited films has typically to be removed by thermal decomposition rather than simple in an evaporation process which takes place in case of classical sol-gel processes.
5–2 in case of Zr(OnPr)4 , or 1:16 in case of (TiOiPr)4 [93, 98]. Finally the solution concentration can be adjusted by further dilution with the solvent to the desired value and is then ready for deposition and thermal processing. In order to elucidate the stabilizing effect of modifiers, a number of studies have been performed in which the amount of water, the type of metal alkoxide, the modifier and the ratio of modifier to metal alkoxide was varied [6, 7, 118–121]. Comparative spectroscopic studies on the hydrolysis behavior of solutions consisting of 6 In case of multicomponent Ti(OR)4 based precursor solutions often 2 equivalents of Hacac are used.
In some cases, the formation of metal-oxygen-metal bonds by oxolation can also result from a de-etheration as shown in Eq. 3) . 5 Metal salts are not subject of this chapter. However the hint to the similarity in the hydrolysis and condensation scheme is given, because metal salts in aqueous media are used in the chemical bath deposition technique, which is described in Chap. 14. 14 T. Schneller Fig. 4 Schematic of the condensation mechanism by (a) alkoxolation and (b) oxolation after .